Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
| Line 77: | Line 77: | ||
| | | | ||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''[[Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617|AR-P 617]]''' | |||
|Positive | |||
|[http://www.allresist.com AllResist] | |||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P610_english_Allresist_product-information.pdf AR-P 617 info] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |||
|a = ?, b = ?, c = ? | |||
|PGMEA | |||
|AR 600-50 | |||
|IPA | |||
|Remover 1165 | |||
| | |||
|} | |} | ||