Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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|PGMEA | |PGMEA | ||
|*AR 300-47 | | | ||
*AR 300-47 | |||
*MIF 726 | *MIF 726 | ||
|H2O | |H2O | ||
| Line 70: | Line 70: | ||
| | | | ||
|PGMEA | |PGMEA | ||
|*AR 300-47 | | | ||
*AR 300-47 | |||
*MIF 726 | *MIF 726 | ||
|H2O | |H2O | ||