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Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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Revision as of 12:42, 5 February 2024
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Thope
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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179
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User supplied resists
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Revision as of 12:57, 5 February 2024
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Thope
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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179
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DTU Nanolab supplied EBL resists
Newer edit →
Line 40:
Line 40:
|Anisole
|Anisole
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|
*AR-600-546
*N50
*AR-600-548
*N50
*MIBK:IPA
|IPA
|IPA
|
|
