Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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|'''AR-N 7520''' | |||
|Negative | |||
|[http://www.allresist.com AllResist] | |||
|Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:pxshi@dtu.dk Peixiong Shi] for information. | |||
|[[media:AR-N7500-7520.pdf|AR-N7500-7520]] | |||
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | |||
|PGMEA | |||
|AR 300-47, TMAH | |||
|H2O | |||
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