Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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Substrates must be prepared for EBL by applying an e-beam sensitive resist and possibly a discharge layer. Please consult the EBL substrate preparation guide on how to prepare your substrate and to find resist information. | Substrates must be prepared for EBL by applying an e-beam sensitive resist and possibly a discharge layer. Please consult the EBL substrate preparation guide on how to prepare your substrate and to find resist information. | ||
[[Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep| EBL substrate preparation guide]] | *[[Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep| EBL substrate preparation guide]] | ||
== Pattern preparation == | == Pattern preparation == | ||