Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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</gallery> | </gallery> | ||
<gallery caption=" C10752: SiO2 etch with Cr mask on wafer piece on Si carrier | <gallery caption=" C10752: SiO2 etch with Cr mask on wafer piece on Si carrier 45 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px"> | ||
File:C10752_09.jpg | File:C10752_09.jpg | ||
File:C10752_07.jpg | File:C10752_07.jpg | ||
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File:C10834T_22.jpg | File:C10834T_22.jpg | ||
</gallery> | </gallery> | ||
<gallery caption=" C10844: SiO2 etch with Cr mask on wafer piece on Si carrier 50 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 20W, coil power:300W" perrow="6" widths="200px" heights="150px"> | |||
File:C10844_09.jpg | |||
File:C10844_11.jpg | |||
File:C10844_07.jpg | |||
File:C10844_05.jpg | |||
File:C10844_02.jpg | |||
File:C10844_13.jpg | |||
</gallery> | |||
===Profile, top view at tilted SEM images on 800 nm pitch and 50% duty cycle ( look at the Cr mask in top of the page=== | ===Profile, top view at tilted SEM images on 800 nm pitch and 50% duty cycle ( look at the Cr mask in top of the page=== | ||