Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
No edit summary |
|||
| Line 22: | Line 22: | ||
=Contrast curve= | =Contrast curve= | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:arp617contrastcurve.png|800px]] | |||
|- | |||
| colspan="1" style="text-align: center;| | |||
AR-P 617.06 contrast curve. | |||
|} | |||
=Development= | =Development= | ||
Revision as of 16:08, 30 January 2024
AR-P 617 is a positive PMMA based E-beam resist from Allresist. Process information provided by Allresist can be found here.
Spin coating
AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:
- Date: January 22nd 2024
- Coater: LabSpin 3
- Substrate: 2" Si
- Acceleration: 1000 RPM/s
- Time: 60 s
- Baking temperature: 200C (setpoint at 222C)
- Baking time: 120 s
|
|
AR-P 617.06 spin curve. |
Resulting resist thickness can be determined as y = axb+c, where y is thickness [nm], x is spin speed [RPM], a = 65274, b = -0.748 and c = 163.1.
Contrast curve
|
|
AR-P 617.06 contrast curve. |