Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions

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Revision as of 23:28, 27 January 2024

AR-P 617 is a positive PMMA based E-beam resist from Allresist. Process information provided by Allresist can be found here.

Spin coating

AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:

  • Date: January 22nd 2024
  • Coater: LabSpin 3
  • Substrate: 2" Si
  • Acceleration: 1000 RPM/s
  • Time: 60 s
  • Baking temperature: 200C (setpoint at 222C)
  • Baking time: 120 s

AR-P 617.06 spin curve.

Resulting resist thickness can be determined as y = axb, where y is thickness [nm], x is spin speed [RPM], a = 11664 and b = -0.442.

Contrast curve

Development

Results

Dual layer for lift off

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