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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3/SiO2 etch: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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|+ Tests with SiO2 etch
|+ Tests with SiO2 etch
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! Wafer number !! C4F8 !! SF6 flow !! Ar !! Coil power !! Platen power !! Presure
! Wafer number !! C4F8 !! SF6 flow !! Ar !! Platen power !! Pressure
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[[File:Peg3 SIO2 uniformity - Contour Plot 5.jpg|400px]]
[[File:Peg3 SIO2 uniformity - Contour Plot 5.jpg|400px]]
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