Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3/SiO2 etch: Difference between revisions
| Line 10: | Line 10: | ||
|+ Tests with SiO2 etch | |+ Tests with SiO2 etch | ||
|- | |- | ||
! C4F8 !! SF6 flow !! Ar !! Coil power !! Platen power !! Presure | ! Wafer number !! C4F8 !! SF6 flow !! Ar !! Coil power !! Platen power !! Presure | ||
|- | |- | ||
| Example || Example || Example || Example || Example || Example || Example | | Example || Example || Example || Example || Example || Example || Example | ||