Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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*[[/Deposition of Silicon Oxide using PECVD|Deposition of Silicon Oxide using PECVD]] | *[[/Deposition of Silicon Oxide using PECVD|Deposition of Silicon Oxide using PECVD]] | ||
==Deposition of Silicon Oxide using sputter deposition | ==Deposition of Silicon Oxide using sputter deposition== | ||
At DTU Nanolab you can also deposit silicon oxide using the Sputter-System [[Specific Process Knowledge/Thin film deposition/Lesker|(Lesker)]] | At DTU Nanolab you can also deposit silicon oxide using the Sputter-System [[Specific Process Knowledge/Thin film deposition/Lesker|(Lesker)]] or the [[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system|Sputter-System Metal Oxide(PC1)]]. An advantage here is that you can deposit on many kinds of material. | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Reactively sputtered SiO2 in Sputter-System Metal Oxide (PC1)|Reactively Sputtered Silicon Oxide in Sputter-System Metal Oxide (PC1)]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Reactively sputtered SiO2 in Sputter-System Metal Oxide (PC1)|Reactively Sputtered Silicon Oxide in Sputter-System Metal Oxide (PC1)]] | ||
*[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]] | *[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]] | ||
Formerly we also had the possibility sputter silicon oxide using the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]. You can read more about that [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|Deposition of Silicon Oxide using IBE/IBSD Ionfab300|here]]. | |||
==Deposition of Silicon Oxide using ALD== | ==Deposition of Silicon Oxide using ALD== | ||