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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBSD of Si: Difference between revisions

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'''''with followup by Berit Herstrøm (bghe) @DTU Nanolab.'''''
'''''with followup by Berit Herstrøm (bghe) @DTU Nanolab.'''''


Please note that it is no longer possible to deposit Si with the Ion beam etcher here at Nanolab.
Please note that it is from 2022 no longer possible to deposit Si with the Ion beam etcher here at Nanolab.


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