Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
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Resulting resist thickness can be determined as y = ax<sup>b</sup>, where y is thickness [nm], x is spin speed [RPM], a = 11664 and b = -0.442. | Resulting resist thickness can be determined as y = ax<sup>b</sup>, where y is thickness [nm], x is spin speed [RPM], a = 11664 and b = -0.442. | ||
=Exposure= | |||
=Development= | |||
=Results= | |||
=Dual layer for lift off= | |||