Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
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*Baking temperature: 200C (setpoint at 222C) | *Baking temperature: 200C (setpoint at 222C) | ||
*Baking time: 120 s | *Baking time: 120 s | ||
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AR-P 617.06 spin curve. | AR-P 617.06 spin curve. | ||
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Resulting resist thickness can be determined as y = ax<sup>b</sup>, where y is thickness, x is spin speed, a = 11664 and b = -0.442. | |||
Revision as of 11:59, 22 January 2024
AR-P 617 is a positive PMMA based E-beam resist from Allresist. Process information provided by Allresist can be found here.
Spin coating
AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:
- Date: January 22nd 2024
- Coater: LabSpin 3
- Substrate: 2" Si
- Acceleration: 1000 RPM/s
- Time: 60 s
- Baking temperature: 200C (setpoint at 222C)
- Baking time: 120 s
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AR-P 617.06 spin curve. |
Resulting resist thickness can be determined as y = axb, where y is thickness, x is spin speed, a = 11664 and b = -0.442.