Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions

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AR-P 617 is a positive PMMA based E-beam resist from Allresist. [https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P610%20english%20Allresist%20product-information.pdf Process information provided by Allresist can be found here.]
AR-P 617 is a positive PMMA based E-beam resist from Allresist. [https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P61020english20Allresist20product-information.pdf Process information provided by Allresist can be found here.]


=Spin coating=
=Spin coating=

Revision as of 11:55, 22 January 2024

AR-P 617 is a positive PMMA based E-beam resist from Allresist. Process information provided by Allresist can be found here.

Spin coating

AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:

  • Date: January 22nd 2024
  • Coater: LabSpin 3
  • Substrate: 2" Si
  • Acceleration: 1000 RPM/s
  • Time: 60 s
  • Baking temperature: 200C (setpoint at 222C)
  • Baking time: 120 s


AR-P 617.06 spin curve.

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