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Specific Process Knowledge/Thermal Process/Annealing: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers
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NLAB-Employees-701, NLAB-LabmanagerAllUsers
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|Annealing of wafers with Al and ALD deposited AL2O3 and TiO2.
|Annealing of wafers with Al and ALD deposited AL2O3 and TiO2.
|Rapid thermal processing, usually, annealing (RTA).
|Rapid thermal processing, usually, annealing (RTA).
|Annealing, oxidation and resist pyrolysis of different samples
|Annealing, oxidation and resist pyrolysis of different samples.
|Rapid thermal processing: RTA (Annealing), RTO (Oxidation), RTN (Nitridation).
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