Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions
| Line 60: | Line 60: | ||
3D: (200.000, 180.000) | 3D: (200.000, 180.000) | ||
|| 3A: -810 µm | || 2024-01-05 | ||
3A: -810 µm | |||
3B: -780 µm | 3B: -780 µm | ||
| Line 60: | Line 60: | ||
3D: (200.000, 180.000) | 3D: (200.000, 180.000) | ||
|| 3A: -810 µm | || 2024-01-05 | ||
3A: -810 µm | |||
3B: -780 µm | 3B: -780 µm | ||