Specific Process Knowledge/Characterization/XRD/Process Info: Difference between revisions
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image:eves_XRD_drawing_series_GiXRD_20230206.png|<b>C 1s</b> signal. | image:eves_XRD_drawing_series_GiXRD_20230206.png|<b>C 1s</b> signal. | ||
</gallery> | </gallery> | ||
For GIXRD you need a small incident slit (which is limited by the footprint on the wafer, so for a small incident angle and a small sample you will need even smaller incident slit size). However the receiving slits can be large / fully open as the PSA will anyway determine what diffraction angles are accepted into the detector. | |||
You can also use the 1D detector mode of the detector if you use an open PSA in the setup. This will speed up data collection. | |||
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1"> | <gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1"> | ||