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Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 53: Line 53:
! Substrate size !! ID !! Slot ID !! Material !! Image !! Slot center coordinates [µm]
! Substrate size !! ID !! Slot ID !! Material !! Image !! Slot center coordinates [µm]
|-
|-
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || 3A: (80.000, 60.000),
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || 3A: (80.000, 60.000)  
3B: (200.000, 60.000),
3B: (200.000, 60.000)  
3C: (80.000, 180.000),
 
3C: (80.000, 180.000)  
 
3D: (200.000, 180.000)
3D: (200.000, 180.000)
|-
|-
| Chips || BM4P-510 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-510_cas.png|800px]]
| Chips || BM4P-510 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-510_cas.png|800px]]
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