Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/EBeamLithography/JEOLRequest click here]''' | |||
Content and illustration by Thomas Pedersen, DTU Nanolab unless otherwise noted. | |||
=Request for user exposure slot= | =Request for user exposure slot= | ||
As of October 16th 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff in order to optimize the use of the system. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign the user a slot of an appropriate length for the exposure. In this way we ensure that booking slots have the correct length and that no tool time is wasted on file preparation. | As of October 16th 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff in order to optimize the use of the system. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign the user a slot of an appropriate length for the exposure. In this way we ensure that booking slots have the correct length and that no tool time is wasted on file preparation. | ||