Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3: Difference between revisions
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This page presents the results of Scandium Nitride deposition using <b>RF</b> Reactive Sputtering in Sputter-System Metal-Nitride (PC3) commonly known as "Cluster Lesker". The deposition target is 4" <b>Sc</b> (0. | This page presents the results of Scandium Nitride deposition using <b>RF</b> Reactive Sputtering in Sputter-System Metal-Nitride (PC3) commonly known as "Cluster Lesker". The deposition target is 4" <b>Sc</b> (0.250" Indium bonded with indium to 3mm Cu plate). Source #1 was used. Materials (ScN) from this source can either be deposited with RF or p-DC sputtering although only RF mode has been tested so far. | ||