Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3: Difference between revisions
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Samples: 6" Si. | Samples: 6" Si without native oxide (HF-treated). | ||
<gallery caption="The photography of Sc target mounted in 4” magnetron (PC3 Src1). "widths="400px" heights="500px" perrow="2"> | <gallery caption="The photography of Sc target mounted in 4” magnetron (PC3 Src1). "widths="400px" heights="500px" perrow="2"> | ||