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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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Bureaucrats, danchip, Administrators
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New page: {| border="2" cellspacing="1" cellpadding="3" align="center" !Recipe !nano1 |- !Tool |Pegasus |- !C<sub>4</sub>F<sub>8</sub> (scc...
 
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
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{| border="2" cellspacing="1" cellpadding="3" align="center"
{| border="2" cellspacing="1" cellpadding="3" align="center"
!Recipe
!Recipe
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|-
!O<sub>2</sub> (sccm)
!O<sub>2</sub> (sccm)
|15
|0
|-
|-
! Coil power (W)
! Coil power (W)
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|-
! Process time (s)
! Process time (s)
|150
|120
|-
|-
! Nominal line width
! Nominal line width
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! 30 nm
! 30 nm
|198
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|-
|-
!60 nm
!60 nm
|256
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|-
|-
!90 nm
!90 nm
|259
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|-
|-
!120 nm
!120 nm
|277
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|-
|-
!150 nm
!150 nm
|269
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|-
|-
! Nominal line width
! Nominal line width
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!30 nm
!30 nm
|79
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|-
|-
!60 nm
!60 nm
|102
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|-
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!90 nm
!90 nm
|104
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!120 nm
!120 nm
|111
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!150 nm
!150 nm
|108
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! zep
! zep
|18
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|-
|-
|}
|}
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