Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride: Difference between revisions

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	* [[Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3\|Deposition of Scandium Nitride (ScN) using reactive sputtering]] in Sputter-System Metal-Nitride(PC3) Source 1 (4-inch target)		* [[Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3\|Deposition of Scandium Nitride (ScN) using reactive sputtering]] in Sputter-System Metal-Nitride(PC3) Source 1 (4-inch target)

	At the moment (October 2023) we have a 4-inch Sc target (0.250" thick bonded to Cu) for PC3 Src1.		At the moment (October 2023) we have a 4-inch Sc target (0.250" thick, bonded to Cu) for PC3 Src1.