Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 220: Line 220:


The chip mark is now scanned and the resulting backscatter signal can be seen in the SSP window. After successfull mark scan the result will also be shown in the '''Calib''' window.
The chip mark is now scanned and the resulting backscatter signal can be seen in the SSP window. After successfull mark scan the result will also be shown in the '''Calib''' window.
=Job execution=
After successful execution of '''SETWFR''' and '''CHIPAL''' the condition file can now be saved and the exposure job can be executed, just as in the case of an unaligned exposure.
=Troubleshooting=
Alignment on the JEOL system can be tricky, in this section we will briefly try and explain the cause and remedy for the most common problems encountered during the alignment process or job execution.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/JEOLAlignment"