Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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Author and images: Thomas Pedersen, DTU Nanolab | |||
=Aligned exposure on JEOL 9500= | =Aligned exposure on JEOL 9500= | ||
There is quite a few things to remember in order to align an exposure to an existing pattern. The example below is a step by step guide illustrating global substrate alignment as well as chip alignment. If your job only requires global alignment simply skip the chip alignment part. In the example we assume a layer, L1, is already defined on the substrate and the goal is to align the next layer, L2, to it. | There is quite a few things to remember in order to align an exposure to an existing pattern. The example below is a step by step guide illustrating global substrate alignment as well as chip alignment. If your job only requires global alignment simply skip the chip alignment part. In the example we assume a layer, L1, is already defined on the substrate and the goal is to align the next layer, L2, to it. | ||