Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
| Line 16: | Line 16: | ||
|} | |} | ||
The following SDF and JDF files will be used for the example. | The following SDF and JDF files will be used for the example. Global alignment is initiated with the '''GLMDET''' command, which in this example is set to '''A''' for automatic. Chip alignment is also initiated with the '''CHIPAL''' command using a single chip mark. The sample reference height detection is set to height detection on each chip mark with the '''HSWITCH OFF,ON''' command. | ||
Global mark positions are stated in the JDF using the '''GLMPOS''' command and chip marks are defined using the '''CHMPOS''' command. | |||
<pre> | <pre> | ||