Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
| Line 142: | Line 142: | ||
In the '''Scan''' pane one can set the '''Scan position''' and '''Scan width''' to suitable values for the mark in question. In general one should scan a cross at a position half way from the center and at least a width of 300 µm to be sure to hit it. In the '''Offset''' pane make sure the offsets are all set to zero. Click '''Ok''' and execute the scan. | In the '''Scan''' pane one can set the '''Scan position''' and '''Scan width''' to suitable values for the mark in question. In general one should scan a cross at a position half way from the center and at least a width of 300 µm to be sure to hit it. In the '''Offset''' pane make sure the offsets are all set to zero. Click '''Ok''' and execute the scan. | ||
The system will now scan the mark position and attempt to optimise the detected backscatter signal in an iterative loop. After a successful scan the last scan result is displayed. | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:SSP_AGCRG.png|400px]] || [[image:AGCRG_copy.png|400px]] | |||
|- | |||
| colspan="2" style="text-align:center;| | |||
Result of a successful gain optimisation. Image: Thomas Pedersen. | |||
|} | |||