Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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!Noco IR | !Noco IR | ||
!Leica INM 100 | !Leica INM 100 | ||
!Zeiss Jenatech | !Zeiss Jenatech | ||
!Nikon Eclipse L200 #1 | !Nikon Eclipse L200 #1 | ||
!Nikon Eclipse L200 #2 | |||
!Nikon Eclipse L200N #3 | !Nikon Eclipse L200N #3 | ||
!Nikon Eclipse L200N #4 | !Nikon Eclipse L200N #4 | ||
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|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | |[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | ||
|[[image:LeicaINM100.jpg|100x100px|thumb|center]] | |[[image:LeicaINM100.jpg|100x100px|thumb|center]] | ||
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | |[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]] | |||
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | ||
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|346-901 | |346-901 | ||
|346-901 | |346-901 | ||
|cleanroom A1 | |cleanroom A1 | ||
|cleanroom D3 | |cleanroom D3 | ||
|cleanroom F3 | |||
|cleanroom E4 | |cleanroom E4 | ||
|cleanroom E5 | |cleanroom E5 | ||
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*50x | *50x | ||
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*5x | *5x | ||
*10x | *10x | ||
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*100x | *100x | ||
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*2.5x | |||
*5x | *5x | ||
*10x | *10x | ||
*20x | *20x | ||
*50x | *50x | ||
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*2.5x | *2.5x | ||
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*20x | *20x | ||
*50x | *50x | ||
*100x | |||
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*2.5x | *2.5x | ||
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|Stereoscopic microscope | |Stereoscopic microscope | ||
|IR imaging | |IR imaging | ||
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*Motorized stage | *Motorized stage | ||
*'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]''' | *'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]''' | ||
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*Darkfield | *Darkfield | ||
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*Polarizer | |||
*Brightfield | *Brightfield | ||
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*Brightfield | *Brightfield | ||
*Darkfield | |||
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*Brightfield | *Brightfield | ||
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|IR camera | |IR camera | ||
|DS-Fi2 | |DS-Fi2 | ||
|None | |||
|DS-Fi1 | |DS-Fi1 | ||
|DS-Fi1 | |DS-Fi1 | ||
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|None | |None | ||
|None | |None | ||
|NIS-D | |NIS-D | ||
|None | |None | ||
|NIS-BR | |NIS-BR | ||
|NIS-D | |||
|NIS-D | |NIS-D | ||
|NIS-D | |NIS-D | ||
Latest revision as of 11:35, 7 November 2023
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This page is written by DTU Nanolab internal
| Nikon SMZ 1000 | Noco IR | Leica INM 100 | Zeiss Jenatech | Nikon Eclipse L200 #1 | Nikon Eclipse L200 #2 | Nikon Eclipse L200N #3 | Nikon Eclipse L200N #4 | Nikon ME 600 | Leica S8 APO | Zeiss Axiotron | |
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| Location | 346-901 | 346-901 | 346-901 | cleanroom A1 | cleanroom D3 | cleanroom F3 | cleanroom E4 | cleanroom E5 | cleanroom F1 | cleanroom Cx1 | cleanroom D3 |
| Responsible group | Wet chemistry | Wet chemistry | Wet chemistry | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography |
| Objectives | Zoom 0.8x - 8x |
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Zoom 1x - 8x |
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| Ocular | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x |
| Special features | Stereoscopic microscope | IR imaging |
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| Camera | None | IR camera | DS-Fi2 | None | DS-Fi1 | DS-Fi1 |
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DS-Fi2 | None | Infinity X |
| Analysis software | None | None | NIS-D | None | NIS-BR | NIS-D | NIS-D | NIS-D | NIS-D | None | DeltaPix |
There are also two optical microscopes in building 451, a stereo microscope and a transmission microscope, that were both previously located in Packlab. Please ask staff / the BioMic group for details.