Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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!Zeiss Jenatech | !Zeiss Jenatech | ||
!Nikon Eclipse L200 #1 | !Nikon Eclipse L200 #1 | ||
!Nikon Eclipse L200N #3 | !Nikon Eclipse L200N #3 | ||
!Nikon Eclipse L200N #4 | !Nikon Eclipse L200N #4 | ||
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|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | |[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | ||
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | |[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | ||
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|cleanroom A1 | |cleanroom A1 | ||
|cleanroom D3 | |cleanroom D3 | ||
|cleanroom E4 | |cleanroom E4 | ||
|cleanroom E5 | |cleanroom E5 | ||
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|Wet chemistry | |Wet chemistry | ||
|Wet chemistry | |Wet chemistry | ||
|Lithography | |Lithography | ||
|Lithography | |Lithography | ||
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*100x | *100x | ||
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*5x | *5x | ||
*10x | *10x | ||
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|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;" | |-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;" | ||
!Ocular | !Ocular | ||
|10x | |10x | ||
|10x | |10x | ||
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*Motorized stage | *Motorized stage | ||
*'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]''' | *'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]''' | ||
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*Brightfield | *Brightfield | ||
*Darkfield | *Darkfield | ||
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*Polarizer | *Polarizer | ||
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*Episcopic | *Episcopic | ||
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*Episcopic | *Episcopic | ||
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|None | |None | ||
|DS-Fi1 | |DS-Fi1 | ||
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*DS-Fi2 | *DS-Fi2 | ||
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|None | |None | ||
|NIS-BR | |NIS-BR | ||
|NIS-D | |NIS-D | ||
|NIS-D | |NIS-D | ||
Revision as of 11:18, 7 November 2023
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This page is written by DTU Nanolab internal
| Nikon SMZ 1000 | Noco IR | Leica INM 100 | Nikon Eclipse L200 #2 | Zeiss Jenatech | Nikon Eclipse L200 #1 | Nikon Eclipse L200N #3 | Nikon Eclipse L200N #4 | Nikon ME 600 | Leica S8 APO | Zeiss Axiotron | |
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| Location | 346-901 | 346-901 | 346-901 | cleanroom F3 | cleanroom A1 | cleanroom D3 | cleanroom E4 | cleanroom E5 | cleanroom F1 | cleanroom Cx1 | cleanroom D3 |
| Responsible group | Wet chemistry | Wet chemistry | Wet chemistry | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography |
| Objectives | Zoom 0.8x - 8x |
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Zoom 1x - 8x |
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| Ocular | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x |
| Special features | Stereoscopic microscope | IR imaging |
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| Camera | None | IR camera | DS-Fi2 | DS-Fi1 | None | DS-Fi1 |
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DS-Fi2 | None | Infinity X |
| Analysis software | None | None | NIS-D | NIS-D | None | NIS-BR | NIS-D | NIS-D | NIS-D | None | DeltaPix |
There are also two optical microscopes in building 451, a stereo microscope and a transmission microscope, that were both previously located in Packlab. Please ask staff / the BioMic group for details.