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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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Bureaucrats, danchip, Administrators
1,918 edits
Line 16: Line 16:
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano35|Sinano3.5]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano35|Sinano3.5]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36|Sinano3.6]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36|Sinano3.6]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33|Sinano3.3]]
|-
|-
!Tool
!Tool
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
Line 36: Line 38:
|15
|15
|15
|15
|0
|-
|-
!BCl<sub>3</sub> (sccm)
!BCl<sub>3</sub> (sccm)
Line 44: Line 47:
|5
|5
|0
|0
|5
|5
|5
|5
|5
Line 56: Line 60:
|0
|0
|0
|0
|15
|-
|-
! Coil power (W)
! Coil power (W)
Line 65: Line 70:
|900 (Load)
|900 (Load)
|900 (Load)
|900 (Load)
|900 (Forward)
|900 (Forward)
|900 (Forward)
|-
|-
Line 76: Line 82:
|60
|60
|60
|60
|75
|-
|-
! Pressure (mtorr)
! Pressure (mtorr)
Line 85: Line 92:
|2
|2
|5
|5
|10
|10
|2
|-
|-
! Process time (s)
! Process time (s)
Line 96: Line 104:
|120
|120
|180
|180
|300
|-
|-
! Nominal line width
! Nominal line width
Line 109: Line 118:
|185
|185
|170
|170
|295
|-
|-
!60 nm
!60 nm
Line 119: Line 129:
|191
|191
|185
|185
|411
|-
|-
!90 nm
!90 nm
Line 129: Line 140:
|222
|222
|253
|253
|566
|-
|-
!120 nm
!120 nm
Line 139: Line 151:
|221
|221
|278
|278
|600
|-
|-
!150 nm
!150 nm
Line 149: Line 162:
|225
|225
|280
|280
|647
|-
|-
! Nominal line width
! Nominal line width
Line 162: Line 176:
|93
|93
|57
|57
|59
|-
|-
!60 nm
!60 nm
Line 172: Line 187:
|96
|96
|62
|62
|82
|-
|-
!90 nm
!90 nm
Line 182: Line 198:
|111
|111
|84
|84
|113
|-
|-
!120 nm
!120 nm
Line 192: Line 209:
|111
|111
|93
|93
|120
|-
|-
!150 nm
!150 nm
Line 202: Line 220:
|113
|113
|93
|93
|129
|-
|-
|
|
Line 215: Line 234:
|38
|38
|39
|39
|59
|-
|-
|}
|}
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