Jump to content

Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions

Indiogo (talk | contribs)
Indiogo (talk | contribs)
Line 106: Line 106:
* '''Max. 100 <sup>o</sup>C/s''' with '''carrier wafer''' or '''sample wafer'''
* '''Max. 100 <sup>o</sup>C/s''' with '''carrier wafer''' or '''sample wafer'''
* '''Max. 50 <sup>o</sup>C/s''' with SiC-coated graphite '''susceptor'''
* '''Max. 50 <sup>o</sup>C/s''' with SiC-coated graphite '''susceptor'''
|style="background:WhiteSmoke; color:black;" align="left"| Different heating rates can be set under temperature control, as well as the step duration.
|style="background:WhiteSmoke; color:black;" align="left"| At faster heating rates, the actual temperature might overshoot from the temperature setpoint in the recipe, and the susceptors/carriers might break.
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates