Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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[[Image:RTP reactor schematic.jpg|400px|thumb|Schematic representation of the RTP2 Jipelec reactor. Image: DTU Nanolab]][[Image:Platen with captions.png|400px|thumb|RTP2 Jipelec chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | [[Image:RTP reactor schematic.jpg|400px|thumb|Schematic representation of the RTP2 Jipelec reactor. Image: DTU Nanolab]][[Image:Platen with captions.png|400px|thumb|RTP2 Jipelec chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | ||
The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image | The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image below. | ||
[[Image:Jipelec lamps.jpg|400px|thumb|center|RTP2 Jipelec halogen lamps. Image: DTU Nanolab internal]] | [[Image:Jipelec lamps.jpg|400px|thumb|center|RTP2 Jipelec halogen lamps. Image: DTU Nanolab internal]] | ||
The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are 3 types of quartz pins available (for the susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8" wafers). | The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are 3 types of quartz pins available (for the SiC-coated graphite susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8" wafers). | ||
[[Image:susceptor Jipelec.jpg|400px|thumb|SiC-coated graphite susceptor. Photo: InêsDiogo@DTU Nanolab, July 2023]] | [[Image:susceptor Jipelec.jpg|400px|thumb|SiC-coated graphite susceptor. Photo: InêsDiogo@DTU Nanolab, July 2023]] | ||