Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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[[Image:Jipelec lamps.jpg|400px|thumb|RTP2 Jipelec halogen lamps. Image: DTU Nanolab internal]] | [[Image:Jipelec lamps.jpg|400px|thumb|RTP2 Jipelec halogen lamps. Image: DTU Nanolab internal]] | ||
The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are 3 types of quartz pins available (for the susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8 | The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are 3 types of quartz pins available (for the susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8" wafers). | ||
[[Image:susceptor Jipelec.jpg|400px|thumb|SiC-coated graphite susceptor. Image: InêsDiogo@DTU Nanolab, July 2023]] | [[Image:susceptor Jipelec.jpg|400px|thumb|SiC-coated graphite susceptor. Image: InêsDiogo@DTU Nanolab, July 2023]] | ||