Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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The machine consists of a reactor chamber, in which different samples can be processed/annealed at temperatures up to 1200 °C. | The machine consists of a reactor chamber, in which different samples can be processed/annealed at temperatures up to 1200 °C. | ||
The chamber can be heated up very rapidly by the use of 18 infrared halogen lamps that are situated in the chamber lid. A quartz plate is placed below the lamps, i.e. between the lamps and the sample(s). Below the platen, there is an optical pyrometer aligned with the center of the substrate, that is placed on the bottom part of the chamber. The platen presents additional inlets where multiple thermocouples can be mounted. These details are exemplified in the images | The chamber can be heated up very rapidly by the use of 18 infrared halogen lamps that are situated in the chamber lid. A quartz plate is placed below the lamps, i.e. between the lamps and the sample(s). Below the platen, there is an optical pyrometer aligned with the center of the substrate, that is placed on the bottom part of the chamber. The platen presents additional inlets where multiple thermocouples can be mounted. These details are exemplified in the images below. | ||
[[Image:RTP reactor schematic.jpg|400px|thumb|center|Schematic representation of the RTP2 Jipelec reactor. Image: DTU Nanolab]] | |||
[[Image:Platen with captions.png|400px|thumb|center|RTP2 Jipelec chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | |||
The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image below. | The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image below. | ||
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In the image below, it is shown the SiC-coated graphite susceptor placed on top of the dedicated quartz pins inside the chamber. | In the image below, it is shown the SiC-coated graphite susceptor placed on top of the dedicated quartz pins inside the chamber. | ||