Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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In the image below, it is shown the SiC-coated graphite susceptor placed on top of the dedicated quartz pins inside the chamber. | In the image below, it is shown the SiC-coated graphite susceptor placed on top of the dedicated quartz pins inside the chamber. | ||
[[Image:RTP reactor schematic.jpg|400px|thumb|RTP2 Jipelec reactor | [[Image:RTP reactor schematic.jpg|400px|thumb|Schematic representation of the RTP2 Jipelec reactor. Image: DTU Nanolab]] | ||
[[Image:Platen with captions.png|400px|thumb|Chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | [[Image:Platen with captions.png|400px|thumb|Chamber platen. Image: Inês Diogo@DTU Nanolab, July 2023]] | ||