Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions
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The chamber can be heated up very rapidly by the use of 18 infrared halogen lamps that are situated in the chamber lid. A quartz plate is placed below the lamps, i.e. between the lamps and the sample(s). Below the platen, there is an optical pyrometer aligned with the center of the substrate, that is placed on the bottom part of the chamber. The platen presents additional inlets where multiple thermocouples can be mounted. These details are exemplified in the images on the right. | The chamber can be heated up very rapidly by the use of 18 infrared halogen lamps that are situated in the chamber lid. A quartz plate is placed below the lamps, i.e. between the lamps and the sample(s). Below the platen, there is an optical pyrometer aligned with the center of the substrate, that is placed on the bottom part of the chamber. The platen presents additional inlets where multiple thermocouples can be mounted. These details are exemplified in the images on the right. | ||
The lamps are divided in three zones so that a uniform temperature can be obtained over the substrate. During the heating, the quartz window below the lamps will get warm. However, the chamber walls are cooled by a cooling water flow and thus remain cold to prevent sample contamination. As already mentioned, the cooling unit is located under the machine. The lamps are cooled by cooling fans (no noisy compressed air cooling like in the old Jipelec RTP). The halogen lamps and the quartz plate are visible in the image below. | |||
The samples are placed above the round metal plate in the bottom of the chamber, i.e. below the halogen lamps. The substrates are meant to be placed on top of three quartz pins. Depending on the type and size of the substrate, there are 3 types of quartz pins available (for the susceptor, a 100 mm wafer and for a 150 mm wafer). Nonetheless, the susceptor should always be used, when possible (except for 8'' wafers). Read more about this in section 7.1. | |||
In the image below, it is shown the SiC-coated graphite susceptor placed on top of the dedicated quartz pins inside the chamber. | |||
[[Image:RTP reactor schematic.jpg|400px|thumb|RTP2 Jipelec reactor schematic]] | [[Image:RTP reactor schematic.jpg|400px|thumb|RTP2 Jipelec reactor schematic]] | ||