Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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==Auto Gain Correction - AGCRG== | ==Auto Gain Correction - AGCRG== | ||
Alignment is done by scanning the beam over the alignment marks and recording the backscatter electron intensity. Thus, it is essential that the gain of the detector system is set to match the substrate material, the mark material and the beam current. | Alignment is done by scanning the beam over the alignment marks and recording the backscatter electron intensity. Thus, it is essential that the gain of the detector system is set to match the substrate material, the mark material and the beam current. The system can automatically optimize the gain of the backscatter detector through the '''AGCRG''' subprogram. Bear in mind, it is not always possible to get sufficient signal. Al alignment marks on a Si substrate will for instance basically never work since the atomic number and hence backscatter intensity of the two materials are almost the same. | ||