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Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 156: Line 156:
*Supports PEC modulation
*Supports PEC modulation
*Faster execution since it is a single SDF sequence
*Faster execution since it is a single SDF sequence
*Works with large V30 files


Drawbacks:
Drawbacks:
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