Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions
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b = str2double(str(x+1:end-1)); | b = str2double(str(x+1:end-1)); | ||
end | end | ||
< | </pre> | ||
The number of doses for dose testing is controlled by the parameter '''m''' while the increase in dose between doses is defined by '''modulation''', it is a percentwise change relative to the base dose. For instance, if one wants to do a dose test with 200 µC/cm<sup>2</sup> as base dose in steps of 10 µC/cm<sup>2</sup> one would set '''modulation = 5'''. | The number of doses for dose testing is controlled by the parameter '''m''' while the increase in dose between doses is defined by '''modulation''', it is a percentwise change relative to the base dose. For instance, if one wants to do a dose test with 200 µC/cm<sup>2</sup> as base dose in steps of 10 µC/cm<sup>2</sup> one would set '''modulation = 5'''. | ||