Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions
| Line 10: | Line 10: | ||
Drawbacks: | Drawbacks: | ||
*The system will perform initial calibration according to the '''PATH''' defined in the JDF for each sequence. This will add several minutes of execution time to each sequence and for a large dose matrix it can cost a lot of additional time. | *The system will perform initial calibration according to the '''PATH''' defined in the JDF for each sequence/dose. This will add several minutes of execution time to each sequence and for a large dose matrix it can cost a lot of additional time. | ||
<pre> | <pre> | ||