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Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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*Supports PEC modulation
*Supports PEC modulation


The drawback is however that the system will perform initial calibration between each sequence, thus for each dose the system will run calibration as defined in the '''PATH''' of the JDF file, this can add several minutes of execution time to each sequence and for a large dose matrix it can cost a lot of additional time.
Drawbacks:
*The system will perform initial calibration according to the '''PATH''' defined in the JDF for each sequence. This will add several minutes of execution time to each sequence and for a large dose matrix it can cost a lot of additional time.


<pre>
<pre>
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