Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions

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-Resulting setup from the example job. The pattern (DTU logo) is instanced 10 times with a pitch of 50 µm. The dose is modulated between 200 and 290 µC/cm<sup>2</sup>. Pattern size is increased  for visibility, actual size is 5 x 8 µm<sup>2</sup>.
+Resulting setup from the example job. The pattern (DTU logo) is instanced 10 times with a pitch of 50 µm. The dose is modulated between 200 and 290 µC/cm<sup>2</sup>.
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