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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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**CD loss due to larger mask faceting
**CD loss due to larger mask faceting
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*Sidewall passivation
*Sidewall passivation↑
**Sample size
**Sample size↓
**Platen power
**Platen power↓
**Coil power
**Coil power↓
**H2 flow
**H2 flow↑
**O2 flow
**O2 flow↓
**Total gas flow rate/pressure
**Total gas flow rate/pressure↑
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