Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
No edit summary |
|||
| Line 1: | Line 1: | ||
This page is under construction. In time we will fill it with relevant process examples and relevant data. | This page is under construction. In time we will fill it with relevant process examples and relevant data. | ||
=Mix-and-match with EBL and UV lithography= | |||
Using mix-and-match it is possible to combine EBL and UV lithography using selected resists. Read more on the [[Specific_Process_Knowledge/Lithography/Mix-and-match|Mix-and-match page.]] | |||
=Single spot EBL on JEOL 9500= | =Single spot EBL on JEOL 9500= | ||
Revision as of 14:22, 9 October 2023
This page is under construction. In time we will fill it with relevant process examples and relevant data.
Mix-and-match with EBL and UV lithography
Using mix-and-match it is possible to combine EBL and UV lithography using selected resists. Read more on the Mix-and-match page.
Single spot EBL on JEOL 9500
Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several µs and hence each spot will become a circular structure by local over exposure. You can read more about this method in the linked article.
Single-spot e-beam lithography for defining large arrays of nano-holes
Article on quality control on the JEOL 9500 system
Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory