Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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!BCl<sub>3</sub> | |||
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!HBr | |||
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Revision as of 09:54, 16 March 2011
This page is under construction
Etching of nanostructures in silicon using the ICP Metal Etcher
Sinano3.0 | Sinano3.1 | Sinano3.2 | Sinano3.3 | Sinano3.4 | Sinano4.0 | Sinano3.5 | Sinano3.6 | |
---|---|---|---|---|---|---|---|---|
Cl2 | 0 | 0 | 0 | 0 | 0 | 20 | 15 | 15 |
BCl3 | 5 | 3 | 5 | 5 | 5 | 0 | 5 | 5 |
HBr | 15 | 17 | 15 | 15 | 15 | 0 | 0 | 0 |