Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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Revision as of 09:54, 16 March 2011

This page is under construction

Etching of nanostructures in silicon using the ICP Metal Etcher

Sinano3.0 Sinano3.1 Sinano3.2 Sinano3.3 Sinano3.4 Sinano4.0 Sinano3.5 Sinano3.6
Cl2 0 0 0 0 0 20 15 15
BCl3 5 3 5 5 5 0 5 5
HBr 15 17 15 15 15 0 0 0