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Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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|style=background:WhiteSmoke; color:black|'''magn.'''
|style=background:WhiteSmoke; color:black|'''magn.'''
|style=background:WhiteSmoke; color:black|'''Relative depostion rate'''
|style=background:WhiteSmoke; color:black|'''Relative depostion rate'''
|-
|Co||Cobalt||Low||0.73
|-
|-
|Cr||Chromium||Med||0.87
|Cr||Chromium||Med||0.87
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|Ni80Fe20||Permalloy||High||0.80
|Ni80Fe20||Permalloy||High||0.80
|}
|}


==Overview of the performance of Sputter-System(Lesker) and some process related parameters==
==Overview of the performance of Sputter-System(Lesker) and some process related parameters==
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