Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Line 682: Line 682:


==Back Side Alignment==
==Back Side Alignment==
<span style="color:red">New specs after the new writehead has been installed - section will be updated soon.</span>


'''Overlay accuracy (spec):''' 1.0 µm
'''Overlay accuracy (spec):''' ±1 µm


'''BSA windows:''' along the X and Y axes, 10 mm wide x 46 mm long, starting 14.5 mm from the center.
'''BSA windows:''' along the X and Y axes, 10 mm wide x 46 mm long, starting 14.5 mm from the center.
Line 728: Line 727:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2" align="center"|Align-flip180-align, 3 points <br/> 375 nm
|rowspan="2" align="center"|Align - flip 180° - align<br>3 point average
|'''X'''
|'''X'''
| -0.625 ±0.125
| -0.625 ±0.125
Line 739: Line 738:
| -0.75 ±0.125
| -0.75 ±0.125


<!--
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
Line 762: Line 762:
|'''Y'''
|'''Y'''
| 0.0 ±0.0
| 0.0 ±0.0
 
-->
|}
|}


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_02_processing"