Specific Process Knowledge/Lithography/EBeamLithography/JEOL Compilation Computer: Difference between revisions

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 ==Using the remote interface==
-The interface behaves alsmost identical to the JEOL 9500 computer, hence all the usual commands can be used, such as:
+To connect to the JCC simply start the PuTTY terminal found on the desktop. Choose the '''JEOL Compilation Computer''' in the Saved Sessions and click '''Open'''. The terminal will now connect and prompt for a password, it is "Jeoleb", remember the capital J. The interface behaves alsmost identical to the JEOL 9500 computer, hence all the usual commands can be used, such as:
-*Change directory in the terminal with the '''CD''' command. Use '''CD job/danchip''' to go to the default working directory
+*Change directory in the terminal with the '''CD''' command. Use '''CD job/1PreExposureFiles''' to go to the pre exposure files working directory
 *Compile with the usual '''schd -exptime sdfname''' command
 *Use '''ebxmenu''' to open the EBX menu, launch the '''Analysis''' program to find '''ACHK'''
 *Edit you SDF/JDF by launching GEdit with the '''gedit&''' command (remember the last &)
+==Limitations of the JEOL Compilation Computer==
+The JCC has three important differences from the JEOL 9500 exposure system:
-The JCC only has a single working condition file (CALPRM) and that is '''2na_ap4'''. Thus it is necesarry to compile with this condition file in all sequences of the SDF file. To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transfering the files to the JEOL 9500 system.
+#It only has a single working condition file (CALPRM) and that is '''2na_ap4'''. Thus it is necesarry to compile with this condition file in all sequences of the SDF file. To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transfering the files to the JEOL 9500 system.
+#The base unit for shot pitch is 0.5 nm instead of 0.25 nm. Thus, if you intend to exposure with 4 nm shot pitch you will use SHOT A, 8 on the JCC while you should use SHOT A, 16 on the JEOL 9500 system
+#The JCC is slower than the JEOL 9500 computer. Hence for large V30 files it is quite slow and one should consider going to the cleanroom and compile on the JEOL 9500 computer instead.