Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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<gallery caption=" | <gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px"> | ||
File:C09721_center_10.jpg | File:C09721_center_10.jpg | ||
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</gallery> | </gallery> | ||
<gallery caption=" | <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px"> | ||
File:C10022_03__06.jpg | File:C10022_03__06.jpg | ||
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</gallery> | </gallery> | ||
<gallery caption=" | <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm" perrow="6" widths="200px" heights="150px"> | ||
File:C10025_03__11.jpg | File:C10025_03__11.jpg | ||
File:C10025_03__09.jpg | File:C10025_03__09.jpg | ||
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</gallery> | </gallery> | ||
<gallery caption=" | <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, O2:5sccm" perrow="6" widths="200px" heights="150px"> | ||
File:C10026_03__05.jpg | File:C10026_03__05.jpg | ||
File:C10026_03__03.jpg | File:C10026_03__03.jpg | ||